Immersion of atomically flat, H-terminated Si(111) surfaces in 7.6 M HI for 0.5 - 4 h caused spontaneous formation of nanosized clusters at the Si surface. X-ray photoelectron spectroscopy analysis suggested that the clusters were composed of silicon iodides (such as SiHxI4-x), produced most probably by Si etching with HI. Atomic force microscopy inspection revealed that the immersion at a low temperature below about 30 degrees C led to the formation of long rod-shaped clusters, oriented in the (112) direction or equivalents, whereas the immersion at a high temperature above 30 degrees C led to the formation of circular dot clusters, their size and shape changing abruptly at about 70 degrees C. It is shown experimentally that the formation of dot clusters at a high immersion temperature is explained on the basis of thermodynamics, whereas that of oriented rod clusters at a low temperature is explained by a kinetics-controlled mechanism.
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