This paper describes how to estimate the uncertainty when Fe in metallic silicon is determined by ICP-AES (Inductively Coupled Plasma Atomic Emission Spectrometry). The technique of the averaged moving range (MR) pooled in-statistical-dynamic-monitor is proposed. The study suggests that the uncertainty contribution of ICP-AES measurement system is, by using this technique, a combination of quality control (QC) and linear fit. This conclusion maximized the combination of the effects on various variances, refrained from the complicated relativity, and favored the uncertainty evaluation for ICP-AES measurement system.
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