Osteoblast alignment, elongation and migration on grooved polystyrene surfaces patterned by Langmuir-Blodgett lithography.

Biomaterials

Klinik und Poliklinik für Mund- und Kiefer-Gesichtschirurgie, Universitätsklinikum Münster, Waldeyerstrasse 30, Münster D-48149, Germany.

Published: February 2005

Topographically patterned surfaces are known to influence cellular behavior in a controllable manner. However, the relatively large surface areas (several cm2) required for many biomaterial applications are beyond the practical limits of traditional lithography. Langmuir-Blodgett lithography, a recently developed method, was used to fabricate regularly spaced grooves of different depths (50 and 150 nm) with a periodicity of 500 nm over several square centimeter on silicon surfaces. These topographies were transferred into polystyrene surfaces by means of nanoimprinting. Primary osteoblasts were cultured on the patterned polymer surfaces. They were observed to align, elongate and migrate parallel to the grooves. The combination of Langmuir-Blodgett lithography with nanoimprinting enables the fabrication of large, nanostructured surface areas on a wide spectrum of different biomaterials. Osteoblasts show a significant anisotropic behavior to these surfaces, which can enhance cell settlement on the surface or be used to direct tissue generation on the biomaterial interface.

Download full-text PDF

Source
http://dx.doi.org/10.1016/j.biomaterials.2004.02.068DOI Listing

Publication Analysis

Top Keywords

langmuir-blodgett lithography
12
polystyrene surfaces
8
surface areas
8
surfaces
6
osteoblast alignment
4
alignment elongation
4
elongation migration
4
migration grooved
4
grooved polystyrene
4
surfaces patterned
4

Similar Publications

The possibility of using colloidal lithography at the industrial level depends on the ability to form defect-free coatings over large areas. The spin-coating method has not yet shown acceptable results, but a more detailed studying of the regularities of this process may improve the quality of masks. The Langmuir-Blodgett method is expected to be the most preferable for forming high-quality large-scale monolayers.

View Article and Find Full Text PDF

Characterization of Chiral Nanostructured Surfaces Made via Colloidal Lithography.

Nanomaterials (Basel)

August 2023

Department of Chemistry and Molecular Design Institute, New York University, New York, NY 10003, USA.

Optically anisotropic materials were produced via colloidal lithography and characterized using scanning electronic microscopy (SEM), confocal microscopy, and polarimetry. A compact hexagonal array mask composed of silica sub-micron particles was fabricated via the Langmuir-Blodgett self-assembly technique. Subsequently, the mask pattern was transferred onto monocrystalline silicon and commercial glass substrates using ion beam etching in a vacuum.

View Article and Find Full Text PDF

Antireflective (AR) nanostructures offer an effective, broadband alternative to conventional AR coatings that could be used even under extreme conditions. In this publication, a possible fabrication process based on colloidal polystyrene (PS) nanosphere lithography for the fabrication of such AR structures on arbitrarily shaped fused silica substrates is presented and evaluated. Special emphasis is placed on the involved manufacturing steps in order to be able to produce tailored and effective structures.

View Article and Find Full Text PDF

Strain in InGaN/GaN multiple-quantum well (MQW) light emitters was relaxed via nanopatterning using colloidal lithography and top-down plasma etching. Colloidal lithography was performed using Langmuir-Blodgett dip-coating of samples with silica particles (d = 170, 310, 690, 960 nm) and a Cl/N inductively coupled plasma etch to produce nanorod structures. The InGaN/GaN MQW nanorods were characterized using X-ray diffraction (XRD) reciprocal space mapping to quantify the degree of relaxation.

View Article and Find Full Text PDF

Light extraction from InGaN/GaN-based multiple-quantum-well (MQW) light emitters is enhanced using a simple, scalable, and reproducible method to create hexagonally close-packed conical nano- and micro-scale features on the backside outcoupling surface. Colloidal lithography via Langmuir-Blodgett dip-coating using silica masks (d = 170-2530 nm) and Cl/N-based plasma etching produced features with aspect ratios of 3:1 on devices grown on semipolar GaN substrates. InGaN/GaN MQW structures were optically pumped at 266 nm and light extraction enhancement was quantified using angle-resolved photoluminescence.

View Article and Find Full Text PDF

Want AI Summaries of new PubMed Abstracts delivered to your In-box?

Enter search terms and have AI summaries delivered each week - change queries or unsubscribe any time!