Asymmetric phase masks for extended depth of field.

Appl Opt

Instituto Nacional de Astrofísica, Optica y Electrónica, Apartado Postal 216, Puebla 72000, Puebla, Mexico.

Published: June 2004

We present a family of asymmetric phase masks that extends the depth of field of an optical system. To verify our proposal, we compute several modulation transfer functions with focus errors, and we report numerical simulations of the images that can be achieved by use of our proposed procedure.

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Source
http://dx.doi.org/10.1364/ao.43.003474DOI Listing

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