[Study on the formation of XeCl at low pressure].

Guang Pu Xue Yu Guang Pu Fen Xi

College of Physics and Technology, Hebei University, Baoding 071002, China.

Published: April 2003

Low pressure dielectric barrier discharge was used to study the formation of XeCl excimer in a mixture of Xe/Cl2 in the range of 70-1,330 Pa. The fluorescence emission spectra in the range of 285-315 nm at different pressure and ratio of Xe/Cl2 were measured. The results indicate that near 308 nm the emission intensities of XeCl formed under the experimental conditions varied with different total pressure and ratio of Xe/Cl2, and the formation efficiency of XeCl excimer reached maximum value at the ratio of 4:1.

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