Metrology of pulsed radiation for 157-nm lithography.

Appl Opt

Physikalisch-Technische Bundesanstalt, Abbestrasse 2-12,10587 Berlin, Germany.

Published: December 2002

In the framework of current development in 157-nm lithography we have investigated the performance of photodetectors with emphasis to their stability and linearity. The measurements were performed in the radiometry laboratories of the Physikalisch-Technische Bundesanstalt at the Berlin electron-storage rings BESSY I and BESSY II with spectrally dispersed synchrotron radiation as well as with highly pulsed F2 laser radiation at 157 nm in combination with a cryogenic radiometer as the primary detector standard. Relative standard uncertainties of as little as 1% were achieved for the calibration of photodetectors in the spectral range of ultraviolet and vacuum-ultraviolet radiation.

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http://dx.doi.org/10.1364/ao.41.007167DOI Listing

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Metrology of pulsed radiation for 157-nm lithography.

Appl Opt

December 2002

Physikalisch-Technische Bundesanstalt, Abbestrasse 2-12,10587 Berlin, Germany.

In the framework of current development in 157-nm lithography we have investigated the performance of photodetectors with emphasis to their stability and linearity. The measurements were performed in the radiometry laboratories of the Physikalisch-Technische Bundesanstalt at the Berlin electron-storage rings BESSY I and BESSY II with spectrally dispersed synchrotron radiation as well as with highly pulsed F2 laser radiation at 157 nm in combination with a cryogenic radiometer as the primary detector standard. Relative standard uncertainties of as little as 1% were achieved for the calibration of photodetectors in the spectral range of ultraviolet and vacuum-ultraviolet radiation.

View Article and Find Full Text PDF

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