Toward tunable thin-film filters for wavelength division multiplexing applications.

Appl Opt

Institut Fresnel, Unité Mixte de Recherche 6133, Centre National de la Recherche Scientifique, Ecole Nationale Supérieure de Physique de Marseille, Domaine Universitaire de Saint Jérĵme, France.

Published: June 2002

AI Article Synopsis

  • The text analyzes issues in developing tunable thin-film filters for wavelength-division multiplexing.
  • It discusses how changes in layer thickness affect the central wavelength for different configurations, emphasizing the importance of reflector structure, spacer thickness, and active layer placement.
  • The text also describes and contrasts practical setups that use temperature or electric fields to control these filters.

Article Abstract

We provide a detailed analysis of the various problems connected with the development of tunable thin-film filters for wavelength-division multiplexing applications. We examine the relation between the change in layer thickness and the central wavelength shift for various configurations and point out the significance of the structure of the reflectors, the spacer thickness, and the location of the active layers. We describe and compare practical arrangements using either temperature or an electric field as the driving parameter.

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Source
http://dx.doi.org/10.1364/ao.41.003277DOI Listing

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