Grain size distribution analysis in polycrystalline LiF thin films by mathematical morphology techniques on AFM images and X-ray diffraction data.

J Microsc

Departamento de Física, Pontifícia Universidade Católica do Rio de Janeiro (PUC-Rio), Rua Marques São Vicente 225, 22453-900, Rio de Janeiro, Brazil; Centro Brasileiro de Pesquisas Físicas, Rua Dr Xavier Sigaud 150, 22290-180, Rio de Janeiro, Brazil; Departamento de Informática, Universidade Iguaçu/FaCET, Av. Abilio Augusto Tavora 2134, Nova Iguaçu, Rio de Janeiro, Brazil.

Published: March 2000

The influence of the deposition temperature on the grain size of polycrystalline lithium fluoride (LiF) thin films is studied using a mathematical morphology method. On atomic force microscopy images of the LiF surface, the grain sizes and shapes are determined by applying the watershed technique, together with a shape factor algorithm. Also, the domain size of the film structure, determined by an X-ray diffraction data analysis, is compared and correlated with the mean grain size as a function of the deposition temperature. In both cases a linear increase with temperature and a very good agreement among the two structural parameters (grain and domain size) was found.

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http://dx.doi.org/10.1046/j.1365-2818.2000.00661.xDOI Listing

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