Approaching Angstrom-Scale Resolution in Lithography Using Low-Molecular-Mass Resists (<500 Da).

Resists that enable high-throughput and high-resolution patterning are essential in driving the semiconductor technology forward. The ultimate patterning performance of a resist in lithography is limited because of the trade-off between resolution, line-width roughness, and sensitivity; improving one or two of these parameters typically leads to a loss in the third. As the patterned feature sizes approach angstrom scale, the trade-off between these three metrics becomes increasingly hard to resolve and calls for a fundamental rethinking of the resist chemistry.

Patterning at the Resolution Limit of Commercial Electron Beam Lithography.

It has been long known that low molecular weight resists can achieve a very high resolution, theoretically close to the probe diameter of the electron beam lithography (EBL) system. Despite technological improvements in EBL systems, the advances in resists have lagged behind. Here we demonstrate that a low-molecular-mass single-source precursor resist (based on cadmium(II) ethylxanthate complexed with pyridine) is capable of a achieving resolution (4 nm) that closely matches the measured probe diameter (∼3.

Electron dynamics in plasmons.

The Particle-in-Cell (PIC) method for plasmons provides a mechanical, single-particle picture of plasmon resonances by tracking in time the movement of all the individual conduction electrons. By applying it to gold nanorods, we demonstrate the usefulness of PIC for extracting time-domain information of plasmons such as plasmon decay times, the relative contribution of each plasmon damping channel, detailed electron movement, as well as radiation and hot electron-emission during damping. An analysis of the time-resolved velocity distribution of the conduction electrons shows that only a small offset in this distribution in each cycle constitutes the plasmon oscillation.

Ultrasmall Designed Plasmon Resonators by Fused Colloidal Nanopatterning.

This work presents a procedure for large-area patterning of designed plasmon resonators that are much smaller than possible with conventional lithography techniques. Fused Colloidal Nanopatterning combines directed self-assembly and controlled fusing of spherical colloidal nanoparticles. The two-step approach first patterns a surface covered with hydrogen silsesquioxane, an electron beam resist, forming traps into which the colloidal gold nanoparticles self-assemble.

Optical resonances of hollow nanocubes controlled with sub-particle structural morphologies.

The structural details of nanoparticles at the sub-particle level are critical for our understanding of their functionalities and the basic mechanisms involved in their formation. In particular, the geometries of such features determine the particle's overall optical response. Hollow metallic nanoparticles (hollow-MNPs) that have cubic geometries, with varying morphologies on their walls and voids in their body, offer a platform to study the effects of such structural features on the properties of single nanoparticles and their ensemble.

High-resolution imaging and spectroscopy of multipolar plasmonic resonances in aluminum nanoantennas.

We report on the high resolution imaging of multipolar plasmonic resonances in aluminum nanoantennas using electron energy loss spectroscopy (EELS). Plasmonic resonances ranging from near-infrared to ultraviolet (UV) are measured. The spatial distributions of the multipolar resonant modes are mapped and their energy dispersion is retrieved.