TiSiCN coatings have been obtained by anode evaporation of titanium and the decomposition of hexamethyldisilazane in an arc discharge, using a self-heated hollow cathode, at the pressure rate of 1 mTorr of the Ar+N gas mixture. The proposed method makes it possible to independently and widely change the amount of metal and precursor vapor flows, the pressure and composition of the vapor-gas mixture and the degree of ionic interaction on the surface of the growing coating within a single discharge system. The paper presents the method and the results of the effect of a current discharge (10-50 A), and the flux of precursor vapours (0-1 g/h), on deposition rates, compositions, and properties of TiSiCN coatings deposited by an advanced combined PVD+PECVD method.
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