Molecular-beam epitaxy-grown Si whisker structures: morphological, optical and electrical properties.

Scanning electron microscopy, spectroscopic ellipsometry, and current-voltage and current-temperature measurements were employed to characterize nanowhisker structures grown by molecular-beam epitaxy on Si(111) substrates. Small clusters of gold deposited on the Si surface were used as the seeds for nanowhisker growth. The diameter of grown nanowhiskers and their length ranged from 70 to 200 nm and from 580 to 890 nm, respectively.