Publications by authors named "Yu'ang Shao"
Effect of Metal Oxide Deposition on the Sensitivity and Resolution of E-Beam Photoresist.
ACS Appl Mater Interfaces
October 2024
Article Synopsis
- Organic-inorganic hybrid resists, like PMMA-AlO, enhance sensitivity and resolution compared to traditional organic photoresists by incorporating metal oxides into PMMA through a method called sequential infiltration synthesis (SIS).
- The study optimized the number of SIS cycles (<23) and examined how different metal oxide amounts and distributions affect the resist's performance during electron beam exposure.
- Results showed that using 20 SIS cycles resulted in optimal electron beam resolution (50 nm line width) while maintaining good pattern transfer due to the etching resistance of AlO, despite lower overall sensitivity compared to fewer SIS cycles.