Schottky Barrier Height and Image Force Lowering in Monolayer MoS Field Effect Transistors.

Understanding the nature of the barrier height in a two-dimensional semiconductor/metal interface is an important step for embedding layered materials in future electronic devices. We present direct measurement of the Schottky barrier height and its lowering in the transition metal dichalcogenide (TMD)/metal interface of a field effect transistor. It is found that the barrier height at the gold/ single-layer molybdenum disulfide (MoS) interfaces decreases with increasing drain voltage, and this lowering reaches 0.

Gap state distribution and Fermi level pinning in monolayer to multilayer MoS field effect transistors.

Gap states and Fermi level pinning play an important role in all semiconductor devices, but even more in transition metal dichalcogenide-based devices due to their high surface to volume ratio and the absence of intralayer dangling bonds. Here, we measure Fermi level pinning using Kelvin probe force microscopy, extract the corresponding electronic state distribution within the band gap, and present a systematic comparison between the gap state distribution obtained for exfoliated single layer, bilayer and thick MoS2 FET samples. It is found that the gap state distribution in all cases decreases from the conduction band edge and is in the order of 1019 eV-1 cm-3 and slightly decreases with increasing channel thickness.

Accurate Method To Determine the Mobility of Transition-Metal Dichalcogenides with Incomplete Gate Screening.

van der Waals layered transition-metal dichalcogenides usually exhibit high contact resistance because of the induced Schottky barriers, which occur at nonideal metal-semiconductor contacts. These barriers usually contribute to an underestimation in the determination of mobility, when extracted by standard, two-terminal methods. Furthermore, in devices based on atomically thin materials, channels with thicknesses of up to a few layers cannot completely screen the applied gate bias, resulting in an incomplete potential drop over the channel; the resulting decreased field effect causes further underestimation of the mobility.

Pinch-Off Formation in Monolayer and Multilayers MoS Field-Effect Transistors.

The discovery of layered materials, including transition metal dichalcogenides (TMD), gives rise to a variety of novel nanoelectronic devices, including fast switching field-effect transistors (FET), assembled heterostructures, flexible electronics, etc. Molybdenum disulfide (MoS), a transition metal dichalcogenides semiconductor, is considered an auspicious candidate for the post-silicon era due to its outstanding chemical and thermal stability. We present a Kelvin probe force microscopy (KPFM) study of a MoS FET device, showing direct evidence for pinch-off formation in the channel by in situ monitoring of the electrostatic potential distribution along the conducting channel of the transistor.