Publications by authors named "Yit-Yian Lua"

Films of pure ethylcellulose (EC) and hydroxypropyl methylcellulose (HPMC) polymers and EC/HPMC blends were prepared from solutions by spin coating where isopropyl alcohol (IPA), water, and IPA/water cosolvent were used as solvents. Surface structures of the films were investigated using optical microscopy, atomic force microscopy (AFM), and Raman mapping and spectroscopy. For the films prepared from EC/HPMC blend solutions using the IPA/water cosolvent, different domain structures such as islands or pits and phase separation between EC and HPMC were observed by optical microscopy and AFM.

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The chemomechanical method has emerged as a straightforward and convenient tool for simultaneously functionalizing and patterning silicon. This technique simply consists of wetting (or exposing) a silicon surface to a reactive chemical and then scribing. Scribing activates the surface and leads to monolayer formation.

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Significant enhancements in ion yields in time-of-flight secondary ion mass spectrometry (TOF-SIMS) are observed when water-soluble analytes are mixed with a polyelectrolyte, e.g., poly(diallyldimethylammonium chloride) or poly(sodium 4-styrenesulfonate), and then deposited in the layer-by-layer method on a surface.

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Static time-of-flight secondary ion mass spectrometry (TOF-SIMS) was performed on monolayers on scribed silicon (Si(scr)) derived from 1-alkenes, 1-alkynes, 1-holoalkanes, aldehydes, and acid chlorides. To rapidly determine the variation in the data without introducing user bias, a multivariate analysis was performed. First, principal components analysis (PCA) was done on data obtained from silicon scribed with homologous series of aldehydes and acid chlorides.

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Methyl-terminated and acyl chloride terminated monolayers are produced when silicon is scribed under mono- and diacid chlorides, respectively. To the best of our knowledge, this is the first report of the reaction between a bare silicon surface and acid chlorides. This reaction takes place by wetting the silicon surface in the air with the acid chloride and scribing.

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