The correlations between the microstructure and nanomechanical properties of a series of thermal annealed Co thin films were investigated. The Co thin films were deposited on glass substrates using a magnetron sputtering system at ambient conditions followed by subsequent annealing conducted at various temperatures ranging from 300 C to 800 C. The XRD results indicated that for annealing temperature in the ranged from 300 C to 500 C, the Co thin films were of single hexagonal close-packed (hcp) phase.
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