Kinetics and proposed mechanisms of hexafluoropropylene oxide dimer acid (GenX) degradation via vacuum-UV (VUV) photolysis and VUV/sulfite processes.

We investigated the degradation of hexafluoropropylene oxide dimer acid (GenX) in water via VUV photolysis and VUV/sulfite reactions under nitrogen-saturated conditions. Approximately 35% and 90% of GenX were degraded in 3 h in the VUV photolysis and VUV/sulfite reaction. While GenX removal rate was highest at pH 6 in VUV photolysis, it increased under alkaline pHs, especially at pH 10, in VUV/sulfite reaction.