Ultrafast plasma method allows rapid immobilization of monatomic copper on carboxyl-deficient g-CN for efficient photocatalytic hydrogen production.

Transition-metal monometallic photocatalysts have received extensive attention owing to the maximization of atomic utilization efficiency. However, in previous related works, single-atom loading and stability are generally low due to limited anchor sites and mechanisms. Recently, adding transition-metal monatomic sites to defective carbon nitrides has a good prospect, but there is still lack of diversity in defect structures and preparation techniques.

H+CO Synergistic Plasma Positioning Carboxyl Defects in g-CN with Engineered Electronic Structure and Active Sites for Efficient Photocatalytic H Evolution.

Defective functional-group-endowed polymer semiconductors, which have unique photoelectric properties and rapid carrier separation properties, are an emerging type of high-performance photocatalyst for various energy and environmental applications. However, traditional oxidation etching chemical methods struggle to introduce defects or produce special functional group structures gently and controllably, which limits the implementation and application of the defective functional group modification strategy. Here, with the surface carboxyl modification of graphitic carbon nitride (g-CN) photocatalyst as an example, we show for the first time the feasibility and precise modification potential of the non-thermal plasma method.

CeO Structure Adjustment by HO the Microwave-Ultrasonic Method and Its Application in Imine Catalysis.

CeO with fusiform structures were prepared by the combined microwave-ultrasonic method, and their morphologies and surface structure were changed by simply adding different amounts of HO (1-5 ml) to the precursor system. The addition of HO changed the PVP micelle structure and the surface state, resulting in CeO with a different specific surface area (64-111 m g) and Ce defects (16.5%-28.

Polymeric structure optimization of g-CN by using confined argon-assisted highly-ionized ammonia plasma for improved photocatalytic activity.

The optimization of the polymeric structure and the modulation of surface amino groups in graphitic carbon nitride (g-CN) are critical but challenging in improving the photoelectric and photocatalytic performances of this polymer semiconductor. Ammonia plasma treatment may provide a fast and useful approach to optimize g-CN materials yet is seriously restricted by the low ionization ability of ammonia. Herein, a confined fast and environmental-friendly ammonia plasma method based on argon-assisted high ionization of NH was developed for efficient modification of raw g-CN.

Surface Amino Group Regulation and Structural Engineering of Graphitic Carbon Nitride with Enhanced Photocatalytic Activity by Ultrafast Ammonia Plasma Immersion Modification.

Surface amino group regulation and structural engineering of graphitic carbon nitride (g-CN) for better catalytic activity have increasingly become a focus of academia and industry. In this work, the ammonia plasma produced by a microwave surface wave plasma generator was developed as a facile source to achieve fast, controllable surface modification, and structural engineering of g-CN by ultrafast plasma treatment in minutes, thus enhancing photocatalytic performance of g-CN. The morphology, surface hydrophilicity, optical absorption properties, and states of C-N bonds were investigated to determine the effect of plasma immersion modification on the g-CN catalyst.