Publications by authors named "Wout Keijers"

The spin scattering induced by magnetic adsorbates on graphene was studied using a combination of transport measurements on a graphene field effect transistor decorated with atomically precise nickel clusters and first principles calculations. A comparative study before and after deposition of Ni clusters unambiguously corroborated the contribution of the added scatterers. An investigation of the spin scattering parameters as a function of the applied voltage indicated a cluster-induced Elliot-Yafet like spin scattering mechanism.

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The adsorption and desorption kinetics of molecules is of significant fundamental and applied interest. In this paper, we present a new method to quantify the energy barriers for the adsorption and desorption of gas molecules on few-atom clusters, by exploiting reaction induced changes of the doping level of a graphene substrate. The method is illustrated for oxygen adsorption on Au clusters.

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The interaction between Au(= 1-6) clusters and graphene is studied using first-principles simulations, based on density functional theory. The computed binding energy between Auand graphene depends on the number of atoms in the cluster and lies between -0.6 eV and -1.

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The growth of single-layer graphene (SLG) by chemical vapor deposition (CVD) on copper surfaces is very popular because of the self-limiting effect that, in principle, prevents the growth of few-layer graphene (FLG). However, the reproducibility of the CVD growth of homogeneous SLG remains a major challenge, especially if one wants to avoid heavy surface treatments, monocrystalline substrates and expensive equipment to control the atmosphere inside the growth system. We demonstrate here that backside tungsten coating of copper foils allows for the exclusive growth of SLG with full coverage by atmospheric pressure CVD implemented in a vacuum-free furnace.

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As the most sensitive magnetic field sensor, the superconducting quantum interference device (SQUID) became an essential component in many applications due to its unmatched performance. Through recently achieved miniaturization, using state-of-the-art fabrication methods, this fascinating device extended its functionality and became an important tool in nanomaterial characterization. Here, we present an accessible and yet powerful technique of targeted atom displacement in order to reduce the size of the weak links of a DC nano-SQUID beyond the limits of conventional lithography.

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