The chemical mechanical polishing/planarization (CMP) is essential for achieving the desired surface quality and planarity required for subsequent layers and processing steps. However, the aggregation of slurry particles caused by abrasive materials can lead to scratches, defects, increased surface roughness, degradation the quality and durability of the finished surface after milling processes during the CMP process. In this study, ceria slurry was prepared using polymer dispersant with zinc salt of ethylene acrylic acid (EAA) copolymer at different contents of 5, 6, and 7 wt% (denoted as D5, D6, and D7) to minimize particle aggregation commonly observed in CMP slurries.
View Article and Find Full Text PDFPlants (Basel)
November 2024
This study evaluated the antioxidant activity of the methanol extract from aromatic (Freyn) K. Schum. by fractionating it with different solvents, aiming to provide theoretical evidence for the development of products related to aromatic (Freyn) K.
View Article and Find Full Text PDFFluorosilicone was combined with aluminum trihydrate (ATH) to induce synergistic flame-retardant and thermal-resistant properties. The surface of ATH was modified with four different silane coupling agents. The flammability and mechanical properties of the fluorosilicone/ATH composites were assessed using an UL94 vertical test and a die shear strength test.
View Article and Find Full Text PDFChemical mechanical polishing/planarization (CMP) is an essential manufacturing process in semiconductor technologies. This method combines chemical and mechanical forces to smooth the surfaces of wafers. The effectiveness of CMP relies on a carefully chosen slurry, demanding a sophisticated manufacturing technology.
View Article and Find Full Text PDFCurr Issues Mol Biol
March 2024
Guava () is a plant widely distributed in tropical and subtropical regions. Its leaves contain a large amount of physiological molecules such as flavonoid, sesquiterpene, triterpenoid, coumarin, alkaloid, and tannin molecules with antioxidative and anti-inflammatory effects. In this study, the use of concentrated .
View Article and Find Full Text PDFCarbon black (CB) particles tend to aggregate in aqueous solutions, and finding an optimum dispersing condition (e.g., selection of the type of dispersant) is one of the important tasks in related industries.
View Article and Find Full Text PDFIn this work, a polymeric nickel complex-modified indium tin oxide (ITO) electrode was prepared by a one-step cold-plasma process of acrylic-Ni complex precursors. Also, the work provides the electrocatalytic oxidation of methanol by a polymeric Ni complex-modified electrode prepared by a simple one-step cold-plasma process. The acrylic-Ni complex precursors were synthesized by complexation of nickel (II) chloride, and acrylic acid in a small amount of water; subsequently we added N,N'-methylene-bis-acrylamide as a crosslinking agent to the complex solution.
View Article and Find Full Text PDFPolymer brush is a soft material unit tethered covalently on the surface of scaffolds. It can induce functional and structural modification of a substrate's properties. Such surface coating approach has attracted special attentions in the fields of stem cell biology, tissue engineering, and regenerative medicine due to facile fabrication, usability of various polymers, extracellular matrix (ECM)-like structural features, and in vivo stability.
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