Variety of nanopatterns on different substrates using PS-b-PMMA and their applications.

High density arrays of nanostructures over a large area can be formed on a range of substrates, such as glass, GaN, SiO2 deposited silicon wafer, etc. by the self-assembly of PS-b-PMMA block copolymers. The morphology of the polymer surface is strongly dependent on the thickness of the polymer layer.

Structures and properties of poly(3-alkylthiophene) thin-films fabricated though vapor-phase polymerization.

Organic semiconducting polymer thin-films of 3-hexylthiophene, 3-octylthiophene, 3-decylthiophene, containing highly oriented crystal were fabricated by gas-phase polymerization using the CVD technique. These poly(3-alkylthiophene) films had a crystallinity up to 80%, and possessed a Hall mobility up to 10 cm2/Vs. The degree of crystalinity and the mobility values increased as the alkyl chain length increased.

Fabrication of nano patterns on various substrates using nanosphere lithography technique.

This paper presents a procedure for fabricating large-area, size-tunable, metal arrays with a periodically different shape using Nanosphere Lithography (NSL). This technique has attracted considerable interest because of its important applications as diffraction devices, chemical and optical data recording. Their ordered arrays can be used for anti-reflection surfaces, bio-sensors and nanopatterning masks.

Fabrication of 2D photonic crystals using block copolymer patterns on as grown LEDs.

Di-block copolymer polystyrene-block-polymethyl methacrylate (PS-b-PMMA) was used to make patterns over a large area of as grown LEDs. The polymer patterns on LEDs surface could be transferred to the underlying p-GaN, the topmost layer of as grown LEDs by both reactive ion etching (RIE) and photo-enhanced chemical (PEC) etching. Removal of remaining polymer chains results in patterned LEDs which shows higher light extraction efficiency.

Fabrication of nanopatterns using block copolymer and controlling surface morphology.

This paper reports an approach for patterning substrates on the nanoscale using a block copolymer, polystyrene-b-polymethylmethacrylate (PS-b-PMMA), which forms cylindrical microdomains. The morphology of the polymer surface was strongly dependent on the thickness of the polymer layer. Spin coating the polymer solution onto the substrate followed by baking resulted in the self-assembly of the components of the polymer.

Low-temperature growth of ZnO nanorods by chemical bath deposition.

Aligned ZnO nanorod arrays were synthesized using a chemical bath deposition method at normal atmospheric pressure without any metal catalyst. A simple two-step process was developed for growing ZnO nanorods on a PET substrate at 90-95 degrees C. The ZnO seed precursor was prepared by a sol-gel reaction.