Formation and Characterization of Hole Nanopattern on Photoresist Layer by Scanning Near-Field Optical Microscope.

Patterning of lines of holes on a layer of positive photoresist SX AR-P 3500/6 (Allresist GmbH, Strausberg, Germany) spin-coated on a quartz substrate is carried out by using scanning near-field optical lithography. A green 532 nm-wavelength laser, focused on a backside of a nanoprobe of 90 nm diameter, is used as a light source. As a result, after optimization of parameters like laser power, exposure time, or sleep time, it is confirmed that it is possible to obtain a uniform nanopattern structure in the photoresist layer.

Polarization versus spatial characteristics of optical beams at a planar isotropic interface.

Three-dimensional monochromatic optical beams of uniform polarization interacting with a planar boundary between two homogeneous, isotropic, and lossless media are analyzed. Generalized Fresnel transmission and reflection coefficients for beam spectra are given. Interrelations induced by cross-polarization coupling between beam profile and phase and beam polarization, or between spin and orbital angular momentum of beams are derived.