Phthalocyanines (Pc) are being researched for their potential in organic electronics, but their low solubility makes them difficult to work with and typically requires complex vacuum techniques for film deposition.
A new method for forming nickel(II) tetraamino-phthalocyanine (AmNiPc) layers through electrochemical deposition on indium-tin oxide (ITO) is introduced as a simpler alternative.
The properties of the resulting AmNiPc layers are extensively analyzed using various advanced techniques, revealing that their electronic characteristics align with those of traditionally prepared NiPc films.