In Situ Conductance Analysis of Zinc Oxide Nucleation and Coalescence during Atomic Layer Deposition on Metal Oxides and Polymers.

Real time in situ conductance is collected continuously during atomic layer deposition (ALD) of zinc oxide films, and trends are used to study ALD nucleation on polypropylene, nylon-6, SiO2, TiO2, and Al2O3 substrates. The detailed conductance change during the ALD cycle is ascribed to changes in surface band bending upon precursor/reactant exposure. Conductive pathways form earlier on the inorganic surfaces than on the polymers, with Al2O3 substrates showing more rapid nucleation than SiO2 or TiO2, consistent with the expected density of nucleation sites (e.

Atomic layer deposition of metal oxide patterns on nonwoven fiber mats using localized physical compression.

Patterning is an essential part of many industrial processes from printing to semiconductor manufacturing. In this work, we demonstrate a new method to pattern and selectively coat nonwoven textiles by atomic layer deposition (ALD) using compressive mask patterning. A physical mask combined with mechanical compression allows lateral definition and fidelity of the ALD coating to be controlled.

Highly conductive and flexible nylon-6 nonwoven fiber mats formed using tungsten atomic layer deposition.

Low-temperature vapor-phase tungsten atomic layer deposition (ALD) using WF6 and dilute silane (SiH4, 2% in Ar) can yield highly conductive coatings on nylon-6 microfiber mats, producing flexible and supple nonwovens with conductivity of ∼1000 S/cm. We find that an alumina nucleation layer, reactant exposure, and deposition temperature all influence the rate of W mass uptake on 3D fibers, and film growth rate is calibrated using high surface area anodic aluminum oxide. Transmission electron microscopy (TEM) reveals highly conformal tungsten coatings on nylon fibers with complex "winged" cross-section.