Tolerancing the surface form of aspheric microlenses manufactured by wafer-level optics techniques.

Tolerancing is an important step toward the fabrication of high-quality and cost-effective lens surfaces. It is critical for wafer-level optics, when up to tens of thousands microlenses are fabricated in parallel and whose surfaces cannot be formed individually. However, approaches developed for macro-optics cannot be directly transposed for microlenses because of differences in fabrication and testing techniques.

Optical characterization of high numerical aperture microlenses for quality assessment and fabrication process optimization.

Accurate characterization of high numerical aperture aspheric microlenses currently is a nonstandard procedure that remains an open challenge. Here, we present and discuss a characterization method based on interferometric and point spread function measurements performed in transmission by a high-resolution interferometric microscope. In particular, we show that a single phase measurement performed under fixed testing conditions can be processed in a simple way that yields wavefront aberration as well as surface topography for plano-convex microlenses with arbitrary asphericity.

Computational rule-based approach for corner correction of non-Manhattan geometries in mask aligner photolithography.

In proximity mask aligner photolithography, diffraction of light at the mask pattern is the predominant source for image shape distortions such as line end shortening and corner rounding. One established method to mitigate the impact of diffraction is optical proximity correction. This method relies on a deliberate sub-resolution modification of photomask features to counteract such shape distortions, with the goal to improve pattern fidelity and uniformity of printed features.

Improvements on the uniformity of large-area microlens arrays in Fused Silica.

The uniformity of large microlens arrays in Fused Silica is governed by the production process. It comprises photolithographic patterning of a spin-coated layer of photoresist on a 200mm wafer with a molten resist reflow process and subsequent dry etching. By investigating systematic influences throughout the production process we show how to steer the lens production process with a single degree of freedom to improve the uniformity of the final microlens array.

Printing sub-micron structures using Talbot mask-aligner lithography with a 193 nm CW laser light source.

A continuous improvement of resolution in mask-aligner lithography is sought after to meet the requirements of an ever decreasing minimum feature size in back-end processes. For periodic structures, utilizing the Talbot effect for lithography has emerged as a viable path. Here, by combining the Talbot effect with a continuous wave laser source emitting at 193 nm, we demonstrate successfully the fabrication of periodic arrays in silicon substrates with sub-micron feature sizes.

Mask-aligner lithography using a continuous-wave diode laser frequency-quadrupled to 193 nm.

We present a mask-aligner lithographic system operated with a frequency-quadrupled continuous-wave diode laser emitting at 193 nm. For this purpose, a 772 nm diode laser is amplified by a tapered amplifier in the master-oscillator power-amplifier configuration. The emission wavelength is upconverted twice, using LBO and KBBF nonlinear crystals in second-harmonic generation enhancement cavities.

Refraction limit of miniaturized optical systems: a ball-lens example.

We study experimentally and theoretically the electromagnetic field in amplitude and phase behind ball-lenses across a wide range of diameters, ranging from a millimeter scale down to a micrometer. Based on the observation, we study the transition between the refraction and diffraction regime. The former regime is dominated by observables for which it is sufficient to use a ray-optical picture for an explanation, e.

Optical characterization of two-dimensional array of 2,048 tilting micromirrors for astronomical spectroscopy.

A micromirror array composed of 2048 silicon micromirrors measuring 200 × 100 μm² and tilting by 25° was developed as a reconfigurable slit mask for multi-object spectroscopy (MOS) in astronomy. The fill factor, contrast, and mirror deformation at both room and cryogenic temperatures were investigated. Contrast was measured using an optical setup that mimics a MOS instrument, and mirror deformation was characterized using a Twyman-Green interferometer.

Design, simulation, fabrication, packaging, and characterization of a MEMS-based mirror array for femtosecond pulse-shaping in phase and amplitude.

We present an in-detail description of the design, simulation, fabrication, and packaging of a linear micromirror array specifically designed for temporal pulse shaping of ultrashort laser pulses. The innovative features of this device include a novel comb-drive actuator allowing both piston and tilt motion for phase- and amplitude-shaping, and an X-shaped laterally reinforced spring preventing lateral snap-in while providing high flexibility for both degrees of freedom.

Spectral phase, amplitude, and spatial modulation from ultraviolet to infrared with a reflective MEMS pulse shaper.

We describe the performance of a reflective pulse-shaper based on a Micro-ElectroMechanical System (MEMS) linear mirror array. It represents a substantial upgrade of a preceding release [Opt. Lett.

Ultraviolet and near-infrared femtosecond temporal pulse shaping with a new high-aspect-ratio one-dimensional micromirror array.

We demonstrate the capabilities of a new optical microelectromechanical systems device that we specifically developed for broadband femtosecond pulse shaping. It consists of a one-dimensional array of 100 independently addressable, high-aspect-ratio micromirrors with up to 3 μm stroke. We apply linear and quadratic phase modulations demonstrating the temporal compression of 800 and 400 nm pulses.

Fabrication and characterization of linear diffusers based on concave micro lens arrays.

We present a new approach of beam homogenizing elements based on a statistical array of concave cylindrical microlens arrays. Those elements are used to diffuse light in only one direction and can be employed together with fly's eye condensers to generate a uniform flat top line for high power coherent light sources. Conception, fabrication and characterization for such 1D diffusers are presented in this paper.

MEMS compatible micro-GRIN lenses for fiber to chip coupling of light.

Graded-Index (GRIN) lenses with a diameter of 125 mum are presented. This diameter enables the assembly of the GRIN lenses onto an optical micro-system using the same passive alignment grooves as used for the light carrying optical fibers. In contrast to refractive lenses, GRIN lenses have flat endfaces and the focal distance of a GRIN lens is defined by its length.

Miniature lamellar grating interferometer based on silicon technology.

We present a lamellar grating interferometer realized with microelectromechanical system technology. It is used as a time-scanning Fourier-transform spectrometer. The motion is carried out by an electrostatic comb drive actuator fabricated by silicon micromachining, particularly by silicon-on-insulator technology.