Polymerizable Nonionic Perfluorinated Photoacid Generators for High-Resolution Lithography.

Advanced photoresists must satisfy stringent sensitivity requirements while maintaining the ability to print ever-shrinking critical dimensions. However, the unavoidable acid diffusion associated with chemically amplified photoresists has led to a trade-off between resolution, line-edge roughness, and sensitivity, which presents a significant challenge for high-resolution lithography. To address this issue, a novel class of alkene-functionalized nonionic perfluorinated photoacid generators (PAGs) is developed.

Exceptional Lithography Sensitivity Boosted by Hexafluoroisopropanols in Photoresists.

Advanced lithography requires highly sensitive photoresists to improve the lithographic efficiency, and it is critical, yet challenging, to develop high-sensitivity photoresists and imaging strategies. Here, we report a novel strategy for ultra-high sensitivity using hexafluoroisopropanol (HFIP)-containing fluoropolymer photoresists. The incorporation of HFIP, with its strong electrophilic property and the electron-withdrawing effect of the fluorine atoms, significantly increases the acidity of the photoresist after exposure, enabling imaging without conventional photoacid generators (PAGs).

New Chemically Amplified Positive Photoresist with Phenolic Resin Modified by GMA and BOC Protection.

In this paper, a chemically amplified (CA) i-line photoresist system is described including a phenolic resin modified with glycidyl methacrylate (GMA) addition and protected with di-tert-butyl dicarbonate (BOC group), here called JB resin. JB resin with different degrees of BOC protection was synthesized and characterized with ultraviolet spectrophotometry, Fourier transform infrared spectroscopy and gel permeation chromatography. These resins were also evaluated in CA resists by formulating the JB resin with a photoacid generator (PAG) and tested at 405 nm and 365 nm exposure wavelengths.

Design of a large Stokes shift ratiometric fluorescent sensor with hypochlorite detection towards the potential application as invisible security ink.

Hypochlorite (ClO) as a well-known highly reactive oxygen species (ROS), is widely used as preservative and household disinfectant in daily life. Although many fluorescence imaging sensors for ClO have been reported, the development of ClO ratio fluorescence sensors with large Stokes shift is still quite limited. This sensor shows obvious benefits including minimizing environmental intervention and improving signal-to-noise ratio.