The controllable fabrication of patterned p-type and n-type channels with precise doping control presents a significant challenge, impeding the realization of complementary metal-oxide-semiconductor (CMOS) logic using a single van der Waals material. However, such an achievement could offer substantial benefits by enabling continued transistor scaling and unprecedented interlayer interconnect technologies. In this study, we devise a precise method for two-dimensional (2D) semiconductor substitutional doping, which allows for the production of wafer-scale 2H-MoTe thin films with specific p-type or n-type doping.
View Article and Find Full Text PDFACS Appl Mater Interfaces
July 2024
Two-dimensional (2D) transition-metal dichalcogenides (TMDCs) are regarded as promising materials for next-generation logic circuits. Top gate field-effect transistors (FETs) have independent gate control ability and can be fabricated directly on TMDC materials without a transfer process. Therefore, it has the merits of device reliability and complementary metal-oxide semiconductor (CMOS) process compatibility, which are demanded in practical circuit-level integration.
View Article and Find Full Text PDFPlanar double heterostructures were initially investigated and have been successfully applied in III-V semiconductor lasers due to their excellent roles in confining both the photons and carriers. Here, we design and fabricate a (PEA)CsPbX (quasi-2D)/CsPbBr QD/quasi-2D double-heterostructure sandwiched in a 3/2 λ DBR microcavity, and then demonstrate a single-mode pure-green lasing with a threshold of 53.7 μJ/cm under nanosecond-pulsed optical pumping.
View Article and Find Full Text PDFACS Appl Mater Interfaces
April 2024
Two-dimensional transition metal dichalcogenides (TMDCs) have natural advantages in overcoming the short-channel effect in field-effect transistors (FETs) and in fabricating three-dimensional FETs, which benefit in increasing device density. However, so far, most reported works related to MoS FETs with a sub-100 nm channel employ mechanically exfoliated materials and all of the works involve electron beam lithography (EBL), which may limit their application in fabricating wafer-scale device arrays as demanded in integrated circuits (ICs). In this work, MoS FET arrays with a side-wall source and drain electrodes vertically distributed are designed and fabricated.
View Article and Find Full Text PDFIn this work, monolithic three-dimensional complementary metal oxide semiconductor (CMOS) inverter array has been fabricated, based on large-scale n-MoS and p-MoTe grown by the chemical vapor deposition method. In the CMOS device, the n- and p-channel field-effect transistors (FETs) stack vertically and share the same gate electrode. High k HfO is used as the gate dielectric.
View Article and Find Full Text PDFCsPbClperovskite is an attractive semiconductor material with characteristics such as a wide bandgap, high chemical stability, and excellent optoelectronic properties, which broaden its application prospects for ultraviolet (UV) and violet photodetectors (PDs). However, large-area CsPbClfilms with high coverage, large grains, and controllable thickness are still difficult to prepare by using the solution method due to the extremely low solubility of their precursors in conventional solvents. Herein, a water-assisted confined re-growth method is developed, and a CsPbClmicrocrystalline film with an area of 3 cm × 3 cm is grown, the thickness of which is controllable within a range of several microns.
View Article and Find Full Text PDFCsPbCl is an attractive wide-bandgap perovskite semiconductor. Herein, we have grown hopper-shaped CsPbCl crystals in a solution droplet dripped on a heated substrate. During the growth, we have observed the impacts of the coffee ring effect and Marangoni flow, which may result in the hopper shape.
View Article and Find Full Text PDFThe integration of two-dimensional (2D) van der Waals semiconductors into silicon electronics technology will require the production of large-scale, uniform, and highly crystalline films. We report a route for synthesizing wafer-scale single-crystalline 2H molybdenum ditelluride (MoTe) semiconductors on an amorphous insulating substrate. In-plane 2D-epitaxy growth by tellurizing was triggered from a deliberately implanted single seed crystal.
View Article and Find Full Text PDF2D semiconductors have emerged as promising candidates for post-silicon nanoelectronics, owing to their unique properties and atomic thickness. However, in the handling of 2D material, various forms of macroscopic damage, such as cracks, wrinkles, and scratches, etc., are usually introduced, which cause adverse effects on the material properties and device performance.
View Article and Find Full Text PDFIt is demonstrated that Mg, Cr, Mn and B can be doped close to GaAs surface by plasma doping without external bias at room temperature (RT). The process only takes a few minutes, and impurity densities in the range of 10-10/cm₃ can be achieved with doping depths about twenty nanometers. The experiment results are analyzed and the physical mechanism is tentatively explained as follows: during the doping process, impurity ion implantation under plasma sheath voltage takes place, simultaneously, plasma stimulates RT diffusion of impurity atom, which plays the main role in the doping process.
View Article and Find Full Text PDFTwo-dimensional (2D) layered semiconductors, with their ultimate atomic thickness, have shown promise to scale down transistors for modern integrated circuitry. However, the electrical contacts that connect these materials with external bulky metals are usually unsatisfactory, which limits the transistor performance. Recently, contacting 2D semiconductors using coplanar 2D conductors has shown promise in reducing the problematic high contact resistance.
View Article and Find Full Text PDFAmong the Mo- and W-based two-dimensional (2D) transition metal dichalcogenides, MoTe is particularly interesting for phase-engineering applications, because it has the smallest free energy difference between the semiconducting 2H phase and metallic 1T' phase. In this work, we reveal that, under the proper circumstance, Mo and Te atoms can rearrange themselves to transform from a polycrystalline 1T' phase into a single-crystalline 2H phase in a large scale. We manifest the mechanisms of the solid-to-solid transformation by conducting density functional theory calculations, transmission electron microscopy, energy dispersive X-ray spectroscopy, X-ray photoelectron spectroscopy, and Raman spectroscopy.
View Article and Find Full Text PDFSolid-state perovskite nanocrystals are promising coherent light sources, as there is optical feedback within the crystal structure. In order to utilize the high performance of perovskites for on-chip applications, or observe new physical phenomena, these crystals must be integrated with pre-fabricated electronic or photonic structures. However, the material's fragility has made the deterministic transfer a great challenge thus far.
View Article and Find Full Text PDFACS Appl Mater Interfaces
July 2017
A new method to employ graphene as top electrode was introduced, and based on that, fully transparent quantum dot light-emitting diodes (T-QLEDs) were successfully fabricated through a lamination process. We adopted the widely used wet transfer method to transfer bilayer graphene (BG) on polydimethylsiloxane/polyethylene terephthalate (PDMS/PET) substrate. The sheet resistance of graphene reduced to ∼540 Ω/□ through transferring BG for 3 times on the PDMS/PET.
View Article and Find Full Text PDFGraphene is a favorable candidate for electrodes of organic light emitting diodes (OLEDs). Graphene has quite a high work function of ∼4.5 eV, and has been extensively studied when used as anodes of OLEDs.
View Article and Find Full Text PDFThe optical absorption properties of a-Si:H have acquired much attention in solar cell(SC) research. In this paper, we studied enhancement of light absorption in the a-Si:H(10%H) SCs with thicknesses from 31.25nm to 2μm and with nano textures of the column-shaped nanohole (CLNH) array and of the cone-shaped nanohole (CNNH) array, via the Finite Difference Time Domain (FDTD) simulation.
View Article and Find Full Text PDFFlexible and transparent electronic and optoelectronic devices have attracted more and more research interest due to their potential applications in developing portable, wearable, low-cost, and implantable devices. We have fabricated and studied high-performance flexible and transparent CdSe nanobelt (NB)/graphene Schottky junction self-powered photovoltaic detectors for the first time. Under 633 nm light illumination, typical photosensitivity and responsivity of the devices are about 1.
View Article and Find Full Text PDFGuang Pu Xue Yu Guang Pu Fen Xi
September 2011
Ag nanocrystal-embedded silicon oxide (SiO2 : Ag) films with varying Ag fractions were prepared on p-Si substrate by magnetron co-sputtering and thermal annealing. Visible electroluminescence (EL) was observed from the structures of ITO/SiO2 : Ag/p-Si. The authors found that Ag nanocrystals in the SiO2 film can not only shift the EL peak evidently but also enhance the EL intensity markedly.
View Article and Find Full Text PDFWe report ultrahigh-performance inverters, each consisting of two top-gate metal-oxide-semiconductor field-effect transistors based on n-CdS nanobelts. High-kappa HfO(2) dielectrics are used as the top-gate oxide layers. The inverters have a large supply voltage (V(DD)) range (from 50 mV to 10 V) and very high voltage gain ( approximately 10, 100, and 1000 at V(DD) = 0.
View Article and Find Full Text PDFA high-performance NOT logic gate (inverter) was constructed by combining two identical n-channel metal-semiconductor field-effect transistors (MESFETs) made on a single CdS nanowire (NW). The inverter has a voltage gain as high as 83, which is the highest reported so far for inverters made on one-dimensional nanomaterials. The MESFETs used in the inverter circuit show excellent transistor performance, such as high on/off current ratio ( approximately 10(7)), low threshold voltage ( approximately -0.
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