Anomalous Plastic Deformation and Sputtering of Ion Irradiated Silicon Nanowires.

Silicon nanowires of various diameters were irradiated with 100 keV and 300 keV Ar(+) ions on a rotatable and heatable stage. Irradiation at elevated temperatures above 300 °C retains the geometry of the nanostructure and sputtering can be gauged accurately. The diameter dependence of the sputtering shows a maximum if the ion range matches the nanowire diameter, which is in good agreement with Monte Carlo simulations based on binary collisions.

Utilizing dynamic annealing during ion implantation: synthesis of silver nanoparticles in crystalline lithium niobate.

Silver nanoparticles (NPs) embedded in lithium niobate were fabricated via ion beam synthesis and are suitable for various plasmonic applications, e.g. enhancement of optical nonlinear effects.

Mechanism of oxide layer growth during annealing of NiTi.

After annealing at 540°C, NiTi is covered by a characteristic oxide layer with an Ni-containing outer and an Ni-free inner titanium oxide region. To elucidate details of the yet unclear formation process, samples were annealed in an atmosphere containing different oxygen isotopes at a time and analyzed by nondestructive ion beam techniques at different stages of the oxidation. During the heating stage, an oxygen permeable "low Ni" titanium oxide forms, and the oxide layer grows inward.

Ultrathin membranes in x-cut lithium niobate.

Ion-beam enhanced etching is used to pattern a bulk lithium niobate crystal with ultrathin membranes. By the implementation of an air gap beneath the membrane, high index contrast is achieved. A buried amorphous layer, created by irradiation with He ions, is removed by means of wet chemical etching in hydro-fluoric acid.

Fabrication of ridge waveguides in zinc-substituted lithium niobate by means of ion-beam enhanced etching.

We present results on the fabrication and characterization of ridge waveguides in zinc-substituted lithium niobate. High-quality waveguides were fabricated by a combination of liquid-phase epitaxy and multiple applications of ion-beam enhanced etching. The two major demands on ridge waveguides, a very low side-wall roughness and a rectangle shape with side-wall angles close to 90 degrees , were realized simultaneously by using this technique.