Publications by authors named "Vasiliki Vrakatseli"

Transparent polycrystalline TiO thin films have been deposited on unheated glass substrates using RF reactive magnetron sputtering. Depositions were carried out at different glancing angles and with different total gas mixture pressures. The variation of these parameters affected the crystal phase composition and the surface morphology.

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Crystalline TiO₂ films were prepared on unheated glass substrates by radio frequency (RF) reactive magnetron sputtering at normal angle of incidence ( = 0°) and at glancing angle ( = 87°). The effect of the glancing angle on the structure, microstructure, and wetting properties of the films was investigated. The inclination of the substrate led to phase transformation of the deposited films from rutile to either rutile/anatase or anatase, depending on the working pressure.

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