Growth of C-Axis Textured AlN Films on Vertical Sidewalls of Silicon Microfins.

A fabrication process is developed to grow c -axis textured aluminum nitride (AlN) films on the sidewall of single-crystal silicon (Si) microfins to realize fin bulk acoustic wave resonators (FinBARs). FinBARs enable ultradense integration of high-quality-factor ( Q ) resonators and low-loss filters on a small chip footprint and provide extreme lithographical frequency scalability over ultra- and super-high-frequency regimes. Si microfins with large aspect ratio are patterned and their sidewall surfaces are atomically smoothened.