A 3D model of photochemical polishing of rough quartz surfaces under direct illumination has been developed. One of the features of the model is its ability to predict the results of a photochemical polishing process without the need for time-consuming calculations. The proposed model analyzes the characteristics of the surface evolution during polishing based on the initial roughness parameters and the polarization of the incident radiation.
View Article and Find Full Text PDFThe enhanced technique of quartz surface nano-local etching is considered. The enhancement of an evanescent field above surface protrusions and, as a result, an increase in the rate of quartz nano-local etching, are proposed. The possibility to reduce the amount of etch products filled in rough surface troughs and control the optimal rate of the surface nano-polishing process is achieved.
View Article and Find Full Text PDFA model for photochemical polishing of a rough quartz surface has been developed that uses the near field rising above a given surface under the action of electromagnetic radiation. The model allows solving the problem of predicting the results without the need for time-consuming calculations. Simulation of the etching of the quartz surface profile in the spatial frequency domain is used.
View Article and Find Full Text PDFThe fused polypeptides of human epidermal growth factor and one or two S-peptide of RNase A was shown to form stoichiometric (1:1) strong noncovalent and enzymatically active complexes with S-protein of RNase A. The dissociation constants for these complexes were found to be 5.0 x 10(-7) M and 1.
View Article and Find Full Text PDFExpression E. coli plasmid were constructed in which the human interleukin-4 (hIL4) synthetic gene is controlled by tac promoter. The expression level of the gene depends on the distance between RBS and the initial codon ATG, with the maximal production in case of the nine base pair distance.
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