Direct Writing of Quasi-Sinusoidal and Blazed Surface Relief Optical Transmission Gratings in BiGeO, Er: LiNbO and Er: Fe: LiNbO Crystals by Nitrogen Ion Microbeams of 5 MeV and 10.5 MeV Energy.

High diffraction efficiency optical transmission gratings with quasi-sinusoidal and saw-tooth surface relief profiles were fabricated in BiGeO, Er: LiNbO and Er: Fe: LiNbO crystals by ion beam implantation. The gratings were directly written by nitrogen ion microbeams at energies of 5 MeV and 10.5 MeV.

Fabrication of Quasi-Sinusoidal Surface Relief Optical Transmission Gratings in Pyrex and IOG Glasses by Implantation with Oxygen and Nitrogen Ion Microbeams of the 5-6 MeV Energy Range.

A method for the fabrication of high diffraction efficiency optical transmission gratings with quasi-sinusoidal profile in glasses by microbeams of medium-mass ions of 5-6 MeV energy was devised and demonstrated. Gratings with a 30 μm grating constant have been manufactured and characterized by interference microscopy and microprofilometry. The obtained surface profiles of the gratings were found to be quasi-sinusoidal with up to 265 nm amplitude.

Graphene Oxide and Polymer Humidity Micro-Sensors Prepared by Carbon Beam Writing.

In this study, novel flexible micro-scale humidity sensors were directly fabricated in graphene oxide (GO) and polyimide (PI) using ion beam writing without any further modifications, and then successfully tested in an atmospheric chamber. Two low fluences (3.75 × 10 cm and 5.

Overview of Polyethylene Terephthalate Foils Patterned Using 10 MeV Carbon Ions for Realization of Micromembranes.

Polymer membranes are conventionally prepared using high-energy particles from radioactive decay or by the bombardment of hundreds of MeVs energy ions. In both circumstances, tracks of damage are produced by particles/ions passing through the polymer, and successively, the damaged material is removed by chemical etching to create narrow pores. This process ensures nanosized pore diameter but with random placement, leading to non-uniform local pore density and low membrane porosity, which is necessary to reduce the risk of their overlapping.

Ion Lithography of Single Ions Irradiation for Spatially Regular Arrays of Pores in Membranes of Polyethylene Terephthalate.

Routinely, in membrane technology, the decay from radioactive particles or the bombardment of ions with MeV energy per nucleon have been employed for the production of narrow and long pores in membranes. Presently, the ion lithography is proposed to make the fabrication cost more affordable. It is prospective for the use of medium capacity accelerators making more feasible the fabrication of customized membranes.