The possibility of forming niobium oxynitride through the nitridation of niobium oxide films in molecular nitrogen by rapid thermal processing (RTP) was investigated. Niobium films 200 and 500 nm thick were deposited via sputtering onto Si(100) wafers covered with a thermally grown SiO(2) layer 100 nm thick. These as-deposited films exhibited distinct texture effects.
View Article and Find Full Text PDF