Field enhancements of packed-bed performance for low-concentration acidic and basic-waste gases from semiconductor manufacturing process.

Low-concentration acidic and basic-waste gas pollutants contribute significantly in the total emission of a facility. Previous results show that the control of high volumetric flow rate (approximately 500 m3/min), low-concentration acidic (< 1 ppm by vol) and basic (< 3 ppm by vol) gases from semiconductor process vent, by conventional wet scrubbing technique is a challenging task. This work was targeted to enhance the performance of packed beds for high-volumetric flow rate, low-concentration acidic (HF, HCl), and basic (NH3)-waste gases from the semiconductor manufacturing process.

Axial flow cyclone for segregation and collection of ultrafine particles: theoretical and experimental study.

In this study, an axial flow cyclone was designed, fabricated, and evaluated at different conditions of air flow rates (Q0) and low-pressure environments (P), especially for the segregation and collection of ultrafine particles. An evaporation/condensation type of aerosol generation system consisting of tube furnace and mixing chamber was employed to produce test aerosols. The test aerosol was then classified by a differential mobility analyzer (DMA) and number concentration was measured by a condensation nuclei counter (CNC) and an electrometer upstream and downstream of the cyclone, respectively.

Inorganic acid emission factors of semiconductor manufacturing processes.

A huge amount of inorganic acids can be produced and emitted with waste gases from integrated circuit manufacturing processes such as cleaning and etching. Emission of inorganic acids from selected semiconductor factories was measured in this study. The sampling of the inorganic acids was based on the porous metal denuders, and samples were then analyzed by ion chromatography.

Emission characteristics of volatile organic compounds from semiconductor manufacturing.

A huge amount of volatile organic compounds (VOCs) is produced and emitted with waste gases from semiconductor manufacturing processes, such as cleaning, etching, and developing. VOC emissions from semiconductor factories located at Science-Based Industrial Park, Hsin-chu, Taiwan, were measured and characterized in this study. A total of nine typical semiconductor fabricators (fabs) were monitored over a 12-month period (October 2000-September 2001).