Production of mixed phase Ti-rich TiO thin films by oxide defect engineered crystallization.

Amorphous TiO has insufficient chemical stability that can be enhanced with annealing induced crystallization. However, the crystalline structure is already predetermined by the defect composition of the amorphous phase. In this paper, we demonstrate that the oxide defects, , oxygen vacancies and Ti states, can be created by O deficiency during ion-beam sputter deposition without affecting the O/Ti ratio of TiO.