Comparison of thermal stability of Mo/Si multilayers with different crystallinities of Mo layers.

To investigate the thermal stability of Mo/Si multilayers with different initial crystallinities of Mo layers, two kinds of Mo/Si multilayers were deposited by DC magnetron sputtering and annealed at 300°C and 400°C. The period thickness compactions of multilayers with crystalized and quasi-amorphous Mo layers were 0.15 nm and 0.

Comparative Study on Microstructure of Mo/Si Multilayers Deposited on Large Curved Mirror with and without the Shadow Mask.

The Mo/Si multilayer mirror has been widely used in EUV astronomy, lithography, microscopy and other fields because of its high reflectivity at the wavelength around 13.5 nm. During the fabrication of Mo/Si multilayers on large, curved mirrors, shadow mask was a common method to precisely control the period thickness distribution.

Stability of Cr/C multilayer during synchrotron radiation exposure and thermal annealing.

The stability of Cr/C multilayer during irradiation or thermal annealing was investigated using grazing incidence X-ray reflectivity measurement, X-ray photoelectron spectroscopy, X-ray diffraction analysis, small-angle X-ray scattering analysis, and soft X-ray reflectivity measurement. One sample was irradiated with a white beam of synchrotron radiation and five other samples were annealed at various temperatures. The 18-h irradiation treatment caused local surface contaminants but did not affect the buried stacks.

Soft X-ray varied-line-spacing gratings fabricated by near-field holography using an electron beam lithography-written phase mask.

A fabrication method comprising near-field holography (NFH) with an electron beam lithography (EBL)-written phase mask was developed to fabricate soft X-ray varied-line-spacing gratings (VLSGs). An EBL-written phase mask with an area of 52 mm × 30 mm and a central line density greater than 3000 lines mm was used. The introduction of the EBL-written phase mask substantially simplified the NFH optics for pattern transfer.

Design of First-Order 121.6 nm Minus Filters.

The equivalent parameters function in Macleod software can be used to calculate the equivalent admittance and phase thickness of multilayers, even when the material is both absorbing and dispersive, and the incidence angle is non-zero. We utilized this software to design first-order 121.6 nm minus filters based on a lanthanum trifluoride (LaF)/magnesium fluoride (MgF) multilayer; a Gaussian-type target curve was also introduced into the design.

Structure and extreme ultraviolet performance of Si/C multilayers deposited under different working pressures.

Narrow bandwidth Si/C multilayer mirrors are fabricated and characterized for the Z-pinch plasma diagnostic at a wavelength of 16.5 nm. To reduce the large stress of the multilayer and maintain a practical reflectivity, different working pressures, from 0.

Optical and structural performance of the Al(1%wtSi)/Zr reflection multilayers in the 17-19nm region.

Two kinds of Al/Zr (Al(1%wtSi)/Zr and Al(Pure)/Zr) multilayers for extreme ultraviolet (EUV) optics were deposited on fluorine doped tin oxide coated glass by using direct-current magnetron sputtering technology. The comparison of the two systems shows that the Al(1%wtSi)/Zr multilayers have the lowest interfacial roughness and highest reflectivity. Based on the X-ray diffraction, the performance of the two systems is determined by the crystallization of Al layer.

Thermal stability of Mg/Co multilayer with B4C, Mo or Zr diffusion barrier layers.

The efficiency of B(4)C, Mo and Zr barrier layers to improve thermal stability of Mg/Co multilayer up to 400 °C is investigated. Multilayers were deposited by direct current magnetron sputtering and characterized using X-ray and extreme ultraviolet reflection. The results suggest that B(4)C barrier layer is not effective due to drastic diffusion at Mg-B(4)C interface.

SiC/W/Ir multilayer-coated grating for enhanced efficiency in 50-100 nm wavelength range in Seya-Namioka mount.

A broadband [SiC/W/Ir](2) multilayer coating was deposited onto a diffraction grating to enhance the grating efficiency in the 50-100 nm wavelength range in a Seya-Namioka mount. The holographic ion-beam etched grating had a laminar profile with 1200 lines/mm. The coating was designed by using the subquarterwave multilayer theory.

Vacuum-ultraviolet blazed silicon grating anisotropically etched by native-oxide mask.

We describe a simple and convenient method of controlling the profile of a blazed grating that consists of using a patterned native-oxide layer of off-cut silicon (111) wafers as the mask of anisotropic etching to maximize the smooth blaze facets of the desired blaze angle and to minimize the deficiencies of the groove apexes. With the blazed-grating profile well controlled by this technique, a 1200 g/mm blazed grating was fabricated that had a blaze angle of 5.0 degrees and smooth blaze facets of about 0.

Broadband multilayer-coated normal incidence blazed grating with approximately 10% diffraction efficiency through the 13-16 nm wavelength region.

Diffraction gratings used in extreme UV are typically coated with periodic multilayer thin films. These coatings have a small bandwidth, thus leading to a narrow usable spectral region of multilayer gratings. Well-designed aperiodic multilayer coatings could provide high reflectivity over a much broader wavelength region, so they could broaden the usable spectral region of multilayer gratings.

Reflective performance of Ir film in vacuum ultraviolet wavelength region.

This paper theoretically and experimentally investigates the reflective performance of Ir films in the vacuum ultraviolet wavelength region. Ir reflecting layers of different thicknesses on various substrates are calculated and fabricated by the ion-beam-sputtering technique. Their reflectance in the 115 nm to 140 nm wavelength region was measured continuously by a reflectometer located at the National Synchrotron Radiation Laboratory.

High reflectivity multilayer for He-II radiation at 30.4 nm.

SiC/Mg and B(4)C/Mo/Si multilayers were designed for He-II radiation at 30.4 nm. These multilayers were prepared by use of a direct current magnetron sputtering system and measured at the National Synchrotron Radiation Laboratory, China.

High-efficiency multilayer-coated ion-beam-etched blazed grating in the extreme-ultraviolet wavelength region.

We describe a simple method to fabricate blazed gratings used in the extreme ultraviolet wavelength region. The method uses an argon and oxygen mixed-gas ion beam to directly etch the grating substrate through a rectangular profile photoresist grating mask. With this method the etched grating groove profile can be well controlled.

Influence of binding layer on the reflective performance of a Au film in vacuum ultraviolet wavelength region.

We investigate the influence of the binding layer on the reflectance of a Au film in vacuum ultraviolet (VUV) wavelength region theoretically and experimentally. The reflectance of Au films on quartz glass substrates with an approximately 2 nm binding layer of Ti, Cr, and Ir are estimated and fabricated. Their reflectance in the 115-140 nm wavelength region are measured continuously by the reflectometer located in the National Synchroton Radiation Laboratory.