Wetting state and mechanical property alteration for the FeSi films using rapid thermal annealing under various temperatures.

The current research demonstrates the modification of the wetting behavior and mechanical features as well as structure and morphology of FeSi films created via facing target sputtering by the rapid thermal annealing (RTA) with the set RTA temperatures () of 200, 400, 600, and 800 °C. Following the RTA process, the crystallinity of FeSi developed under 400 °C or below. At the 600 °C and 800 °C , new crystal orientations emerged for FeSi and then -FeSi, respectively.