Evidence Against Carbonization of the Thin-Film Filters of the onboard the .

In spite of strict limits on outgassing from organic materials, some spacecraft instruments making long-term measurements of solar extreme ultraviolet (EUV) radiation still suffer significant degradation. While such measures have reduced the rate of degradation, they have not completely eliminated it in some cases. For example, in five years, the aluminum filters used in the (EVE) instruments onboard the (SDO) suffered losses exceeding 40% at 30.

EUV-induced carbon growth at contaminant pressures between 10 mbar and 10 mbar: Experiment and model.

Carbon contamination induced by ultraviolet (UV) radiation affects precision optics in applications as diverse as semiconductor lithography and satellite observations of the Sun. Our previous experiments have shown that low-intensity UV-induced surface contamination depends quasi-logarithmically on the partial pressure of the organic contaminant due to the poly-dispersive nature of the surface-adsorbate system. This complex dependence presents difficulties because, without a physically motivated model, it cannot be extrapolated to low pressures.

Note: Thermally stable thin-film filters for high-power extreme-ultraviolet applications.

We investigated several types of thin-film filters for high intensity work in the extreme-ultraviolet (EUV) spectral range. In our application, with a peak EUV intensity of 2.7 W cm(-2), Ni-mesh-backed Zr filters have a typical lifetime of 20 h, at which point they suffer from pinholes and a 50% loss of transmission.

A synchrotron beamline for extreme-ultraviolet photoresist testing.

Before being used in an extreme-ultraviolet (EUV) scanner, photoresists must first be evaluated for sensitivity and tested to ensure that they will not contaminate the scanner optics. The new NIST facility described here provides data on the contamination potential of the outgas products of a candidate resist by simultaneously irradiating a multilayer optic and a nearby resist-coated wafer with EUV radiation. The facility can also be used without changing its configuration to provide accurate resist dose-to-clear measurements.

Transmission grating based extreme ultraviolet imaging spectrometer for time and space resolved impurity measurements.

A free standing transmission grating based imaging spectrometer in the extreme ultraviolet range has been developed for the National Spherical Torus Experiment (NSTX). The spectrometer operates in a survey mode covering the approximate spectral range from 30 to 700 Å and has a resolving capability of δλ/λ on the order of 3%. Initial results from space resolved impurity measurements from NSTX are described in this paper.

Method for the Characterization of Extreme-Ultraviolet Photoresist Outgassing.

Outgassing from photoresists illuminated by extreme ultraviolet radiation can lead to degradation of the very expensive multilayer-coated optics in an extreme ultraviolet stepper. Reliable quantification of the various organic molecules outgassed by photoresists has been a challenging goal. We have designed a compact system for this measurement.

Optical constants of in situ-deposited films of important extreme-ultraviolet multilayer mirror materials.

We have performed angle-dependent reflectance measurements of in situ magnetron sputtered films of B(4)C, C, Mo, Si, and W. The Fresnel relations were used to determine the complex index of refraction from the reflectance data in the region of approximately 35-150 eV. In the cases of Si, C, and B(4)C we found excellent agreement with published data.

High-efficiency fast scintillators for "optical" soft x-ray arrays for laboratory plasma diagnostics.

Scintillator-based "optical" soft x-ray (OSXR) arrays have been investigated as a replacement for the conventional silicon (Si)-based diode arrays used for imaging, tomographic reconstruction, magnetohydrodynamics, transport, and turbulence studies in magnetically confined fusion plasma research. An experimental survey among several scintillator candidates was performed, measuring the relative and absolute conversion efficiencies of soft x rays to visible light. Further investigations took into account glass and fiber-optic face-plates (FOPs) as substrates, and a thin aluminum foil (150 nm) to reflect the visible light emitted by the scintillator back to the optical detector.

Extreme-ultraviolet efficiency measurements of freestanding transmission gratings.

We report new, near-normal-incidence, transmission grating efficiency results at selected extreme-ultraviolet wavelengths between 4.5 and 30.5 nm for two transmission gratings, one with a period of 200 nm and the other with a period of 400 nm.

Design and performance of capping layers for extreme-ultraviolet multilayer mirrors.

Multilayer lifetime has emerged as one of the major issues for the commercialization of extreme-ultraviolet lithography (EUVL). We describe the performance of an oxidation-resistant capping layer of Ru atop multilayers that results in a reflectivity above 69% at 13.2 nm, which is suitable for EUVL projection optics and has been tested with accelerated electron-beam and extreme-ultraviolet (EUV) light in a water-vapor environment.

Towards High Accuracy Reflectometry for Extreme-Ultraviolet Lithography.

Currently the most demanding application of extreme ultraviolet optics is connected with the development of extreme ultraviolet lithography. Not only does each of the Mo/Si multilayer extreme-ultraviolet stepper mirrors require the highest attainable reflectivity at 13 nm (nearly 70 %), but the central wavelength of the reflectivity of these mirrors must be measured with a wavelength repeatability of 0.001 nm and the peak reflectivity of the reflective masks with a repeatability of 0.

Mass Absorption Coefficient of Tungsten and Tantalum, 1450 eV to 2350 eV: Experiment, Theory, and Application.

The mass absorption coefficients of tungsten and tantalum were measured with soft x-ray photons from 1450 eV to 2350 eV using an undulator source. This region includes the M3, M4, and M5 absorption edges. X-ray absorption fine structure was calculated within a real-space multiple scattering formalism; the predicted structure was observed for tungsten and to a lesser degree tantalum as well.

Si/B(4)C narrow-bandpass mirrors for the extreme ultraviolet.

We report the results of extreme-ultraviolet reflectance measurements and structural characterization of multilayer mirrors made by sequential sputter deposition of Si and B(4)C. Compared with Si/Mo multilayers, Si/B(4)C have a much narrower bandpass (deltalambda) and better off-peak rejection but lower peak reflectance (R(0)). Mirrors with three different designs gave the following results: R(0) = 0.

Soft-x-ray damage to p-terphenyl coatings for detectors.

The organic phosphor p-terphenyl is used as a wavelength-converter coating in some soft-x-ray detectors. We have measured the absolute photoluminescent efficiency of p-terphenyl as a function of incident photon energy from 36 to 191 eV. We have also measured changes in the efficiency caused by soft-x-ray fluence (total photons absorbed per unit area) at several photon energies in this range.

The New NIST/ARPA National Soft X-Ray Reflectometry Facility.

We have recently begun a series of upgrades to the NIST/ARPA National Reflectometry Facility at the Synchrotron Ultraviolet Radiation Facility. The facility currently consists of a new monochromator and the original sample manipulator which allows us to measure optical components less than 10 cm in diameter. The monochromator offers high throughput and modest resolution over the wavelength range 3.

Influence of electrical isolation on the structure and reflectivity of multilayer coatings deposited on dielectric substrates.

Multilayers prepared with electrically isolated or grounded surfaces during deposition are shown to have dramatically different hard-x-ray, soft-x-ray, and neutron reflectivity characteristics. The effect has been observed for (100) silicon wafers, fused silica, and borate glass substrates of different sizes and with different surface roughness and flatness for multilayer structures prepared by rf and dc magnetron sputtering.