Sub-5 nm hard x-ray point focusing by a combined Kirkpatrick-Baez mirror and multilayer zone plate.

Compound optics such as lens systems can overcome the limitations concerning resolution, efficiency, or aberrations which fabrication constraints would impose on any single optical element. In this work we demonstrate unprecedented sub-5 nm point focusing of hard x-rays, based on the combination of a high gain Kirkpatrick-Baez (KB) mirror system and a high resolution W/Si multilayer zone plate (MZP) for ultra-short focal length f. The pre-focusing allows limiting the MZP radius to below 2 μm, compatible with the required 5 nm structure width and essentially unlimited aspect ratios, provided by enabling fabrication technology based on pulsed laser deposition (PLD) and focused ion beam (FIB).

Fabrication of multilayer Laue lenses by a combination of pulsed laser deposition and focused ion beam.

X-ray diffractive techniques using Fresnel zone plate lenses of various forms are of great technical interest because of their ability to form images at very high spatial resolution, but the zone plates are unfortunately very hard to produce by lithography. Alternatively, multilayer Laue lenses (MLLs) and multilayer zone plates are used due to the higher and easily adjustable aspect ratio necessary for different wavelengths. In this paper, the fabrication of a MLL by a combination of pulsed laser deposition and focused ion beam machining is described.