Influence of extraction grid on ion beam characteristics.

This work is a part of the development of a laser ion source (LIS) for multiply charged ion injectors. This experiment is devoted to the investigation of the effect of a metal grid on the extracted ion characteristics. The energy spectra of the ions in the plasma expanding into a drift tube with and without a grid have been compared.

The vacuum arc ion source for indium and tin ions implantation into phase change memory thin films.

One of the most prospective electrical and optical nonvolatile memory types is the phase change memory based on chalcogenide materials, particularly GeSbTe. Introduction of dopants is an effective method for the purposeful change of GeSbTe thin film properties. In this work, we used the ion implantation method for the introduction of In and Sn into GeSbTe thin films by a Multipurpose Test Bench (MTB) at the National Research Center "Kurchatov Institute"-Institute for Theoretical and Experimental Physics.

Surface modification of ferritic steels using MEVVA and duoplasmatron ion sources.

Metal Vapor Vacuum Arc (MEVVA) ion source (IS) is a unique tool for production of high intensity metal ion beam that can be used for material surface modification. From the other hand, the duoplasmatron ion source provides the high intensity gas ion beams. The MEVVA and duoplasmatron IS developed in Institute for Theoretical and Experimental Physics were used for the reactor steel surface modification experiments.

Molecular ion sources for low energy semiconductor ion implantation (invited).

Smaller semiconductors require shallow, low energy ion implantation, resulting space charge effects, which reduced beam currents and production rates. To increase production rates, molecular ions are used. Boron and phosphorous (or arsenic) implantation is needed for P-type and N-type semiconductors, respectively.

First experiments with the negative ion source NIO1.

Neutral Beam Injectors (NBIs), which need to be strongly optimized in the perspective of DEMO reactor, request a thorough understanding of the negative ion source used and of the multi-beamlet optics. A relatively compact radio frequency (rf) ion source, named NIO1 (Negative Ion Optimization 1), with 9 beam apertures for a total H(-) current of 130 mA, 60 kV acceleration voltage, was installed at Consorzio RFX, including a high voltage deck and an X-ray shield, to provide a test bench for source optimizations for activities in support to the ITER NBI test facility. NIO1 status and plasma experiments both with air and with hydrogen as filling gas are described.