Publications by authors named "T Druga"

We investigate the structural, electronic, and transport properties of substitutional defects in SiC-graphene by means of scanning tunneling microscopy and magnetotransport experiments. Using ion incorporation via ultralow energy ion implantation, the influence of different ion species (boron, nitrogen, and carbon) can directly be compared. While boron and nitrogen atoms lead to an effective doping of the graphene sheet and can reduce or raise the position of the Fermi level, respectively, (12)C(+) carbon ions are used to study possible defect creation by the bombardment.

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Electronic transport on a macroscopic scale is described by spatially averaged electric fields and scattering processes summarized in a reduced electron mobility. That this does not capture electronic transport on the atomic scale was realized by Landauer long ago. Local and non-local scattering processes need to be considered separately, the former leading to a voltage drop localized at a defect, the so-called Landauer residual-resistivity dipole.

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We have developed a new scanning tunneling potentiometry technique which can-with only minor changes of the electronic setup-be easily added to any standard scanning tunneling microscope (STM). This extension can be combined with common STM techniques such as constant current imaging or scanning tunneling spectroscopy. It is capable of performing measurements of the electrochemical potential with microvolt resolution.

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If a current of electrons flows through a normal conductor (in contrast to a superconductor), it is impeded by local scattering at defects as well as phonon scattering. Both effects contribute to the voltage drop observed for a macroscopic complex system as described by Ohm's law. Although this concept is well established, it has not yet been measured around individual defects on the atomic scale.

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