Silicon dioxide mask by plasma enhanced atomic layer deposition in focused ion beam lithography.

In this work, focused ion beam (FIB) lithography was developed for plasma enhanced atomic layer deposited (PEALD) silicon dioxide SiO hard mask. The PEALD process greatly decreases the deposition temperature of the SiO hard mask. FIB Ga ion implantation on the deposited SiO layer increases the wet etch resistivity of the irradiated region.

High-quality crystallinity controlled ALD TiO2 for waveguiding applications.

We demonstrate a novel atomic layer deposition (ALD) process to make high-quality nanocrystalline titanium dioxide (TiO(2)) with intermediate Al(2)O(3) layers to limit the crystal size. The process is based on titanium chloride (TiCl(4))+water and trimethyl aluminum (TMA)+ozone processes at 250°C deposition temperature. The waveguide losses measured using a prism coupling method for 633 and 1551 nm wavelengths are as low as 0.

Low-loss silicon slot waveguides and couplers fabricated with optical lithography and atomic layer deposition.

We demonstrate low-loss silicon slot waveguides patterned with 248 nm deep-UV lithography and filled with atomic layer deposited aluminum oxide. Propagation losses less than 5 dB/cm are achieved with the waveguides. The devices are fabricated using low-temperature CMOS compatible processes.

Towards athermal organic-inorganic guided mode resonance filters.

We demonstrate guided-mode resonance filters featuring an amorphous TiO(2) layer fabricated by atomic layer deposition on a polymeric substrate. The thermal properties of such filters are studied in detail by taking into account both thermal expansion of the structure and thermo-optic coefficients of the materials. We show both theoretically and experimentally that these two effects partially compensate for each other, leading to nearly athermal devices.

Single-layer one-dimensional nonpolarizing guided-mode resonance filters under normal incidence.

We demonstrate that properly designed one-dimensional guided-mode resonance filters (GMRFs) with only one grating layer can exhibit a nonpolarizing resonant filtering effect under normal incidence. A sinusoidal profile nonpolarizing GMRF is realized by photoinduced surface-relief grating formation on thin films of polymer-azobenzene complexes and subsequent atomic layer deposition, showing the feasibility of fabrication of such compact GMRFs.