Publications by authors named "T A Klar"

We present newly developed buffer systems that significantly improve the efficiency of a photochemically induced surface modification at the single molecule level. Buffers with paramagnetic cations and radical oxygen promoting species facilitate laser-assisted protein adsorption by photobleaching (LAPAP) of single fluorescently labelled oligonucleotides or biotin onto multi-photon-lithography-structured 2D and 3D acrylate scaffolds. Single molecule fluorescence microscopy has been used to quantify photopainting efficiency.

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Until very recently, the enhancement of multiphoton-based optical lithography by stimulated emission depletion (STED) inspired techniques was limited mostly to (meth)acrylates. Epoxides, which play an important role in semiconductor clean-room technology, were basically excluded from capitalizing on STED-inspired lithography, and if they were successfully used in STED-inspired lithography, the achievable structure sizes remained at 125 nm and above. We now found that using 2-chlorothioxanthone (CTX) as a sensitizer for a sulfonium salt acting as the photoinitiator allows for shrinking the structure size down to 83 nm.

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Recently, 2D/3D direct laser writing has attracted increased attention due to its broad applications ranging from biomedical engineering to aerospace. 3D nanolithography of water-soluble protein-based scaffolds have been envisioned to provide a variety of tunable properties. In this paper, we present a functional protein-based photoresist with tunable mechanical properties that is suitable for multiphoton lithography (MPL).

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Direct laser writing by two-photon lithography has been enhanced substantially during the past two decades by techniques borrowed from stimulated emission depletion (STED) microscopy. However, STED-inspired lithography was so far limited to radical polymerizations, mostly to acrylates and methacrylates. Cationic polymers did not derive benefits from this technique.

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