Atomic Layer Deposition in Bio-Nanotechnology: A Brief Overview.

Atomic layer deposition (ALD) is a technique increasingly used in nanotechnology and ultrathin film deposition; it is ideal for films in the nanometer and Angstrom length scales. ALD can effectively be used to modify the surface chemistry and functionalization of engineering-related and biologically important surfaces. It can also be used to alter the mechanical, electrical, chemical, and other properties of materials that are increasingly used in biomedical engineering and biological sciences.

Enhancing surface characteristics of Ti-6Al-4V for bio-implants using integrated anodization and thermal oxidation.

Modifications of Ti-6Al-4V surface roughness, wettability and composition are increasingly studied to improve cellular viability on biomedical implants involving Ti-6Al-4V. In this study, it is shown that modification of Ti-6Al-4V samples using anodization (for the formation of titania nanotubes) combined with thermal oxidation (TO) results in superior surface characteristics to those of a smooth, rough, anodized-smooth or anodized-rough surface alone. Surface characterization is performed using water contact angle (WCA) measurements, white-light interferometry, Fourier transform infrared spectroscopy (FTIRS), field emission scanning electron microscopy and grazing incidence X-ray diffraction (GIXRD).