Rapid aberration correction for diffractive X-ray optics by additive manufacturing.

Diffraction-limited hard X-ray optics are key components for high-resolution microscopy, in particular for upcoming synchrotron radiation sources with ultra-low emittance. Diffractive optics like multilayer Laue lenses (MLL) have the potential to reach unprecedented numerical apertures (NA) when used in a crossed geometry of two one-dimensionally focusing lenses. However, minuscule fluctuations in the manufacturing process and technical limitations for high NA X-ray lenses can prevent a diffraction-limited performance.

Nanobeam X-ray fluorescence and diffraction computed tomography on human bone with a resolution better than 120 nm.

Studying nanostructured hierarchical materials such as the biomineralized bone is challenging due to their complex 3D structures that call for high spatial resolution. One route to study such materials is X-ray powder diffraction computed tomography (XRD-CT) that reveals the 3D distribution of crystalline phases and X-ray fluorescence computed tomography (XRF-CT) that provides element distributions. However, the spatial resolution of XRD-CT has thus far been limited.

Point focusing with flat and wedged crossed multilayer Laue lenses.

Point focusing measurements using pairs of directly bonded crossed multilayer Laue lenses (MLLs) are reported. Several flat and wedged MLLs have been fabricated out of a single deposition and assembled to realise point focusing devices. The wedged lenses have been manufactured by adding a stress layer onto flat lenses.

Full-field X-ray microscopy with crossed partial multilayer Laue lenses.

We demonstrate full-field X-ray microscopy using crossed multilayer Laue lenses (MLL). Two partial MLLs are prepared out of a 48 μm high multilayer stack consisting of 2451 alternating zones of WSi2 and Si. They are assembled perpendicularly in series to obtain two-dimensional imaging.

Ptychography with multilayer Laue lenses.

Two different multilayer Laue lens designs were made with total deposition thicknesses of 48 µm and 53 µm, and focal lengths of 20.0 mm and 12.5 mm at 20.