The Influence of Systolic Blood Pressure at the Time of Extubation on the Development of Postoperative Spinal Epidural Hematoma.

Background: The most common cause of neurological complications after a biportal endoscopic spine surgery (BESS) is postoperative spinal epidural hematomas (POSEH). The objective of this study was to determine the influence of systolic blood pressure at extubation (e-SBP) on POSEH.

Methods: A total of 352 patients who underwent single-level decompression surgery including laminectomy and/or discectomy with BESS under the diagnosis of spinal stenosis and herniated nucleus pulposus between August 1, 2018, and June 30, 2021, were reviewed retrospectively.

Drawing Guideline for JKMS Manuscripts (03): Pyramid Charts.

The appropriate plot effectively conveys the author's conclusions to the readers. () will provide a series of special articles to show you how to make consistent and excellent plots more easily. In this article, we will cover pyramid charts.

The Influence of Femoral Internal Rotation on Patellar Tracking in Total Knee Arthroplasty Using Gap Technique.

Backgroud: Femoral internal rotation in total knee arthroplasty (TKA) is well known as one of the main causes of patellar maltracking. Although femoral internal rotation in TKA is considered unacceptable due to the risk of patellar maltracking, it is sometimes required for ligament balancing. We evaluated the influence of femoral internal rotation on patellar tracking in TKA performed using the gap technique.

Drawing Guideline for 'Hip and Pelvis': Plot with Error Bar.

The appropriate plots effectively convey the author's conclusions to the readers. 'Hip and Pelvis' will provide a series of special articles to show how to make consistent and excellent plots easier. In this article, we will cover plots with error bars.

Deep-UV microsphere projection lithography.

In this Letter, we present a single-exposure deep-UV projection lithography at 254-nm wavelength that produces nanopatterns in a scalable area with a feature size of 80 nm. In this method, a macroscopic lens projects a pixelated optical mask on a monolayer of hexagonally arranged microspheres that reside on the Fourier plane and image the mask's pattern into a photoresist film. Our macroscopic lens shrinks the size of the mask by providing an imaging magnification of ∼1.

Bimetallic non-alloyed NPs for improving the broadband optical absorption of thin amorphous silicon substrates.

We propose the use of bimetallic non-alloyed nanoparticles (BNNPs) to improve the broadband optical absorption of thin amorphous silicon substrates. Isolated bimetallic NPs with uniform size distribution on glass and silicon are obtained by depositing a 10-nm Au film and annealing it at 600°C; this is followed by an 8-nm Ag film annealed at 400°C. We experimentally demonstrate that the deposition of gold (Au)-silver (Ag) bimetallic non-alloyed NPs (BNNPs) on a thin amorphous silicon (a-Si) film increases the film's average absorption and forward scattering over a broad spectrum, thus significantly reducing its total reflection performance.

Antireflective disordered subwavelength structure on GaAs using spin-coated Ag ink mask.

We present a simple, cost-effective, large scale fabrication technique for antireflective disordered subwavelength structures (d-SWSs) on GaAs substrate by Ag etch masks formed using spin-coated Ag ink and subsequent inductively coupled plasma (ICP) etching process. The antireflection characteristics of GaAs d-SWSs rely on their geometric profiles, which were controlled by adjusting the distribution of Ag etch masks via changing the concentration of Ag atoms and the sintering temperature of Ag ink as well as the ICP etching conditions. The fabricated GaAs d-SWSs drastically reduced the reflection loss compared to that of bulk GaAs (>30%) in the wavelength range of 300-870 nm.

Localized surface plasmon resonance with broadband ultralow reflectivity from metal nanoparticles on glass and silicon subwavelength structures.

Metal nanoparticles (NPs) are well known to increase the efficiency of photovoltaic devices by reducing reflection and increasing light trapping within device. However, metal NPs on top flat surface suffer from high reflectivity losses due to the backscattering of the NPs itself. In this paper, we experimentally demonstrate a novel structure that exhibits localized surface plasmon resonance (LSPR) along with broadband ultralow reflectivity over a wide range of wavelength.

Wafer-scale broadband antireflective silicon fabricated by metal-assisted chemical etching using spin-coating Ag ink.

We report broadband antireflective disordered subwavelength structures (d-SWSs), which were fabricated on 4-inch silicon wafers by spin-coating Ag ink and metal-assisted chemical etching. The antireflection properties of the d-SWSs depend on its dimensions and heights, which were changed by the sintering temperature of the spin-coated Ag ink and etching time. The fabricated d-SWSs drastically reduced surface reflection over a wide range of wavelengths and incident angles, providing good surface uniformity.

Multifunctional light escaping architecture inspired by compound eye surface structures: From understanding to experimental demonstration.

We present bioinspired artificial compound eye surface structures that consist of antireflective subwavelength structures (SWSs) on hexagonally patterned microstructures (MSs), for the purpose of efficient light escaping inside light-emitting materials/devices. Theoretical understanding and geometrical optimization of SWSs on MSs are described together with rigorous coupled-wave analysis. As a proof of this concept, AlGaInP red light-emitting diodes (LEDs) with SWS/MSs were fabricated, and a light output power enhancement of 72.

Antireflective property of thin film a-Si solar cell structures with graded refractive index structure.

We report the antireflective property of thin film amorphous silicon (a-Si) solar cell structures based on graded refractive index structure together with theoretical analysis. Optimizations of the index profile are performed using the rigorous coupled-wave analysis method. The graded refractive index structure fabricated by oblique angle deposition suppresses optical reflection over a wide range of wavelength and incident angle, compared to the conventional structure.

Antireflective properties of porous Si nanocolumnar structures with graded refractive index layers.

We report on the antireflective characteristics of porous silicon (Si) nanocolumnar structures consisting of graded refractive index layers and carry out a rigorous coupled-wave analysis simulation. The refractive index of Si is gradually modified by a tilted angle electron beam evaporation method. For the fabricated Si nanostructure with a Gaussian index profile of 100 nm, reflectivity (R) of less than 7.