Tolerance effect of a shock-free atmospheric plasma on human skin.

Unlabelled: In this work, a shock-free argon-fed plasma plume was generated by a variable-frequency power supply and the discharge characteristics were investigated from the voltage and current waveforms between 72 and 92 kHz frequencies. The higher electron temperature dominates the plasma chemical process and the average plasma temperature is about 30 ℃ under these conditions. The influence of non-thermal atmospheric plasma plume length and plume temperature on Ar gas flow is optimized at 7 sL/min.

Development of fast heating electron beam annealing setup for ultra high vacuum chamber.

We report the design and development of a simple, electrically low powered and fast heating versatile electron beam annealing setup (up to 1000 °C) working with ultra high vacuum (UHV) chamber for annealing thin films and multilayer structures. The important features of the system are constant temperature control in UHV conditions for the temperature range from room temperature to 1000 ºC with sufficient power of 330 W, at constant vacuum during annealing treatment. It takes approximately 6 min to reach 1000 °C from room temperature (∼10(-6) mbar) and 45 min to cool down without any extra cooling.