Effect of Oxygen Sputter Pressure on the Structural, Morphological and Optical Properties of ZnO Thin Films for Gas Sensing Application.

ZnO thin films were prepared on glass substrates at low (5 × 10 mbar) and high (3 × 10 mbar) sputter pressure using dc reactive magnetron sputtering. The structural, morphological, compositional and optical properties of the thin films were investigated. XRD patterns of both films confirmed the polycrystalline nature of the films with hexagonal Wurtzite structure.