Tuning Surface Chemoresistivity of Au Ultrathin Films Using Metal Deposition via Surface-Limited Redox Replacement of the Underpotentially Deposited Pb Monolayer.

The presented work investigates the chemoresistivity of Au ultrathin films, whose surface is modified by deposition of few monolayers of Au, Pd, or AuPd alloy. The model adsorbate in this study was the HS ion from 0.1 M NaCl solution having concentrations ranging from 0 to 40 ppm.

Electroless Deposition of Pb Monolayer: A New Process and Application to Surface Selective Atomic Layer Deposition.

The present work demonstrates an electroless (e-less) deposition of Pb monolayer on Au and Cu surface whose morphology and properties resemble its underpotentially deposited counterpart. Our results and analysis show that the e-less Pb monolayer deposition is a surface selective, surface controlled, self-terminating process. Results also show that the electroless Pb monolayer deposition is enabling a phenomenon for new deposition method called "electroless atomic layer deposition" (e-less ALD).

Finite Size Effects in Submonolayer Catalysts Investigated by CO Electrosorption on Pt/Pd(100).

A combination of scanning tunneling microscopy, subtractively normalized interfacial Fourier transform infrared spectroscopy (SNIFTIRS), and density functional theory (DFT) is used to quantify the local strain in 2D Pt clusters on the 100 facet of Pd and its effect on CO chemisorption. Good agreement between SNIFTIRS experiments and DFT simulations provide strong evidence that, in the absence of coherent strain between Pt and Pd, finite size effects introduce local compressive strain, which alters the chemisorption properties of the surface. Though this effect has been widely neglected in prior studies, our results suggest that accurate control over cluster sizes in submonolayer catalyst systems can be an effective approach to fine-tune their catalytic properties.

Efficient C-C bond splitting on Pt monolayer and sub-monolayer catalysts during ethanol electro-oxidation: Pt layer strain and morphology effects.

Efficient catalytic C-C bond splitting coupled with complete 12-electron oxidation of the ethanol molecule to CO2 is reported on nanoscale electrocatalysts comprised of a Pt monolayer (ML) and sub-monolayer (sML) deposited on Au nanoparticles (Au@Pt ML/sML). The Au@Pt electrocatalysts were synthesized using surface limited redox replacement (SLRR) of an underpotentially deposited (UPD) Cu monolayer in an electrochemical cell reactor. Au@Pt ML showed improved catalytic activity for ethanol oxidation reaction (EOR) and, unlike their Pt bulk and Pt sML counterparts, was able to generate CO2 at very low electrode potentials owing to efficient C-C bond splitting.

Development of Pinhole-Free Amorphous Aluminum Oxide Protective Layers for Biomedical Device Applications.

This paper describes synthesis of ultrathin pinhole-free insulating aluminum oxide layers for electronic device protection in corrosive liquid environments, such as phosphate buffered saline (PBS) or clinical fluids, to enable emerging biomedical applications such as biomolecular sensors. A pinhole-free 25-nm thick amorphous aluminum oxide layer has been achieved using ultra-high vacuum DC magnetron reactive sputtering of aluminum in oxygen/argon plasma followed by oxygen plasma post-processing. Deposition parameters were optimized to achieve the best corrosion protection of lithographically defined device structures.

Close-packed noncircular nanodevice pattern generation by self-limiting ion-mill process.

We describe a self-limiting, low-energy argon-ion-milling process that enables noncircular device patterns, such as squares or hexagons, to be formed using precursor arrays of uniform circular openings in poly(methyl methacrylate) defined using electron beam lithography. The proposed patterning technique is of particular interest for bit-patterned magnetic recording medium fabrication, where square magnetic bits result in improved recording system performance. Bit-patterned magnetic medium is among the primary candidates for the next generation magnetic recording technologies and is expected to extend the areal bit density limits far beyond 1 Tbit/in(2).