Correction for 'Plasma-assisted fabrication of ultra-dispersed copper oxides in and on C-rich carbon nitride as functional composites for the oxygen evolution reaction' by Mattia Benedet , , 2024, https://doi.org/10.1039/d4dt02186j.
View Article and Find Full Text PDFSignificant efforts have been continuously devoted to the mastering of green catalysts for the oxygen evolution reaction (OER), whose sluggish kinetics prevents a broad market penetration of water splitting as a sustainable route for large-scale hydrogen production. In this extensive scenario, carbon nitride (CN)-based systems are in focus thanks to their favorable characteristics, and, whereas graphitic CN has been largely investigated, the potential of amorphous carbon nitride (a-CN) systems remains almost entirely unexplored. In this regard, our study presents a novel two-step plasma-assisted route to a-CN systems comprising ultra-dispersed, "quasi-atomic" CuO ( = 1, 2).
View Article and Find Full Text PDFIn this work, the infiltration of TiN powders by electrophoretic deposition (EPD) in aqueous media was considered as alternative method to reduce the size craters and the roughness of commercial porous Ti substrates. Ti substrates can be used as suitable supports for the deposition of dense hydrogen separation TiNx-based membranes by physical vapor deposition (PVD) techniques. The influence of various EPD deposition parameters on surface morphology and roughness of TiN-infiltrated substrates were investigated in order to optimize their surface properties.
View Article and Find Full Text PDFIn this article, the depositions and functional characterizations of Ta-N and Ta-Al-N coatings for protection purposes, grown by reactive high-power impulse magnetron sputtering onto silicon substrates, are described. Nitride films were grown while changing the substrate polarization voltage (i.e.
View Article and Find Full Text PDFThis scientific work aims to optimize the preparation of titanium nitride coatings for selective H separation using the Reactive High Power Impulse Magnetron Sputtering technology (RHiPIMS). Currently, nitride-based thin films are considered promising membranes for hydrogen. The first series of TiN/Si test samples were developed while changing the reactive gas percentage (N%) during the process.
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