Coulomb Screening and Scattering in Atomically Thin Transistors across Dimensional Crossover.

Layered two-dimensional dichalcogenides are potential candidates for post-silicon electronics. Here, we report insightfully experimental and theoretical studies on the fundamental Coulomb screening and scattering effects in these correlated systems, in response to the changes of three crucial Coulomb factors, including electric permittivity, interaction distance, and density of Coulomb impurities. We systematically collect and analyze the trends of electron mobility with respect to the above factors, realized by synergic modulations on channel thicknesses and gating modes in dual-gated MoS transistors with asymmetric dielectric cleanliness.

Clean BN-Encapsulated 2D FETs with Lithography-Compatible Contacts.

Device passivation through ultraclean hexagonal BN encapsulation has proven to be one of the most effective ways of constructing high-quality devices with atomically thin semiconductors that preserve the ultraclean interface quality and intrinsic charge transport behavior. However, it remains challenging to integrate lithography-compatible contact electrodes with flexible distributions and patterns. Here, we report the feasibility of a straightforward integration of lithography-defined contacts into BN-encapsulated two-dimensional field-effect transistors (2D FETs), giving rise to overall device quality comparable to the state-of-the-art results from the painstaking pure dry transfer processing.